GHG Summary Report

CO2 equivalent emissions from facility subparts C-II, SS, and TT (metric tons):74,831.5
CO2 equivalent emissions from supplier subparts LL-QQ (metric tons):
Biogenic CO2 emissions from facility subparts C-II, SS, and TT (metric tons):0
Cogeneration Unit Emissions Indicator:N
GHG Report Start Date:2023-01-01
GHG Report End Date:2023-12-31
Description of Changes to Calculation Methodology:
Plant Code Indicator:N
Primary NAICS Code:334413
Second Primary NAICS Code:

Parent Company Details:

Parent Company Name:CYPRESS SEMICONDUCTOR CORP
Address:198 Champion Ct, San Jose, CA 95134
Percent Ownership Interest:100

Subpart C: General Stationary Fuel Combustion

Gas Information Details

Gas Name	Carbon Dioxide
Gas Quantity	97.9 (Metric Tons)
Own Result?

Gas Name	Biogenic Carbon dioxide
Gas Quantity	0 (Metric Tons)
Own Result?

Gas Name	Methane
Gas Quantity	0 (Metric Tons)
Own Result?

Gas Name	Nitrous Oxide
Gas Quantity	0 (Metric Tons)
Own Result?

Unit Details:

Unit Name : GP-Site
Unit Description :

Small Unit Aggregation Details:
Use Ivt Indicator: N
Highest Maximum Rated Heat Input Capacity: 28.576
Cumulative Maximum Rated Heat Input Capacity: 28.576

Emission Details:
Annual CO₂ mass emissions from sorbent: 0 (Metric Tons)
Annual Biogenic CO2 Emissions: 0 (metric tons)
Annual Fossil fuel based CO2 Emissions: 0 (metric tons)

Tier Fuel Details:

Fuel : Natural Gas (Weighted U.S. Average)
Tier Name : Tier 1 (Equation C-1)
Tier Methodology Start Date : 2023-01-01
Tier Methodology End Date : 2023-12-31

Fuel Emission Details :

Total CO2 emissions	Total CH4 emissions	Total N2O emissions	Total CH4 emissions CO2e	Total N2O emissions CO2e
84.8 (Metric Tons)	0.00 (Metric Tons)	0.000 (Metric Tons)	0 (Metric Tons)	0 (Metric Tons)

Equation C1/C8 Inputs :
Fuel Quantity : 1558560 (scf/year)

Fuel : Distillate Fuel Oil No. 2
Tier Name : Tier 1 (Equation C-1)
Tier Methodology Start Date : 2023-01-01
Tier Methodology End Date : 2023-12-31

Fuel Emission Details :

Total CO2 emissions	Total CH4 emissions	Total N2O emissions	Total CH4 emissions CO2e	Total N2O emissions CO2e
13.1 (Metric Tons)	0.00 (Metric Tons)	0.000 (Metric Tons)	0 (Metric Tons)	0 (Metric Tons)

Equation C1/C8 Inputs :
Fuel Quantity : 1284 (gallons/year)

Subpart I: Electronics Manufacturing

Gas Information Details

Gas Name	Nitrous Oxide
Gas Quantity	30.865 (Metric Tons)
Own Result?

Gas Name	Other
Other Gas Name	HFE-7300 (1,1,1,2,2,3,4,5,5,5-decafluoro-3-methoxy-4-trifluoromethyl-pentane)
Other Gas CAS Registry Number	132182-92-4
Other Gas Linear Chemical Formula	CF3CF2CF(OCH3)CF(CF3)2
Other Gas GHG Group	Saturated HFEs and HCFEs with 3 or more carbon-hydrogen bonds
Gas Quantity	0.15 (Metric Tons)
Own Result?

Gas Name	Other
Other Gas Name	HFE-7500 (3-ethoxy-1,1,1,2,3,4,4,5,5,6,6,6-dodecafluoro-2-trifluoromethyl-hexane)
Other Gas CAS Registry Number	297730-93-9
Other Gas Linear Chemical Formula	CF3CF2CF2CF(OC2H5)CF(CF3)2
Other Gas GHG Group	Saturated HFEs and HCFEs with 3 or more carbon-hydrogen bonds
Gas Quantity	0.012 (Metric Tons)
Own Result?

Gas Name	PFC-14 (Perfluoromethane)
Gas CAS Registry Number	75-73-0
Gas Linear Chemical Formula	CF4
Gas Quantity	3.527 (Metric Tons)
Own Result?

Gas Name	HFC-23
Gas CAS Registry Number	75-46-7
Gas Linear Chemical Formula	CHF3
Gas Quantity	0.655 (Metric Tons)
Own Result?

Gas Name	HFC-41
Gas CAS Registry Number	593-53-3
Gas Linear Chemical Formula	CH3F
Gas Quantity	0.183 (Metric Tons)
Own Result?

Gas Name	Perfluorobuta-1,3-diene
Gas CAS Registry Number	685-63-2
Gas Linear Chemical Formula	CF2=CFCF=CF2
Gas Quantity	0.018 (Metric Tons)
Own Result?

Gas Name	Perfluorocyclobutane
Gas CAS Registry Number	115-25-3
Gas Linear Chemical Formula	C-C4F8
Gas Quantity	0.543 (Metric Tons)
Own Result?

Gas Name	Nitrogen trifluoride
Gas CAS Registry Number	7783-54-2
Gas Linear Chemical Formula	NF3
Gas Quantity	0.845 (Metric Tons)
Own Result?

Gas Name	PFC-116 (Perfluoroethane)
Gas CAS Registry Number	76-16-4
Gas Linear Chemical Formula	C2F6
Gas Quantity	0.231 (Metric Tons)
Own Result?

Gas Name	PFC C-1418
Gas CAS Registry Number	559-40-0
Gas Linear Chemical Formula	c-C5F8
Gas Quantity	0.009 (Metric Tons)
Own Result?

Gas Name	Sulfur hexafluoride
Gas CAS Registry Number	2551-62-4
Gas Linear Chemical Formula	SF6
Gas Quantity	0.297 (Metric Tons)
Own Result?

Subpart I Fab Details (for Fab25):

Unique Name/Identifier	Fab25
Optional Description
What does the fab manufacture? [§98.96]	Semiconductor
Method used to calculate f-GHG emissions for this fab from the plasma etch/wafer clean and chamber clean process types [§98.96(d)]	DefaultEmissionFactors
Does the fab have abatement systems (as defined in 98.98) through which F-GHG or N2O flow?	Yes
Is the fab claiming destruction or removal efficiency for those abatement systems (as defined in 98.98) at the fab? [§98.96(p)]	Yes
What Is the Diameter of the Wafers Manufactured at this Fab? (Greater than 300 mm) [§98.96(b)]	No
What Is the Diameter of the Wafers Manufactured at this Fab? (300 mm) [§98.96(b)]	No
What Is the Diameter of the Wafers Manufactured at this Fab? (200 mm) [§98.96(b)]	Yes
What Is the Diameter of the Wafers Manufactured at this Fab? (150 mm) [§98.96(b)]	No
What Is the Diameter of the Wafers Manufactured at this Fab? (Less than 150 mm) [§98.96(b)]	No
List the Specific Wafer Size(s) Less than 150mm Manufactured at this Fab [§98.96(b)]
Annual Manufacturing Capacity at this Fab used in Equation I-5 (square meters) [§98.96(a)]
Annual production for this fab in terms of substrate surface area (e.g., silicon, PV-cell, glass) (square meters) [§98.96(e)]
Do the emissions for this fab include emissions from research and development activities, as defined in 98.6?	Yes
What is the approximate percentage of total GHG emissions, on a metric ton CO2e basis, that are attributable to research and development activities? [§98.96(x)]	less than 5 percent
What is the effective fab-wide destruction or removal efficiency value calculated using Equations I-26, I-27 and I-28, as appropriate? (decimal fraction) [§98.96(r)]	0.038
What method was used for this fab to develop the apportioning factors for fluorinated GHG and N20 consumption? [§98.96(m)(1)]
Optional description of your system and method(s) used in the fab-specific apportioning model
Description of quantifiable metric used in engineering model to apportion gas consumption [§98.96(m)(1)]
Start date selected under 98.94(c)(2)(i). [§98.96(m)(2)]	2023-01-01
End date selected under 98.94(c)(2)(i). [§98.96(m)(2)]	2023-12-31
Certification that the gas(es) selected under 98.94(c)(2)(ii) for this fab corresponds to the largest quantity(ies) consumed, on a mass basis, of fluorinated GHG used at the fab in the reporting year which the facility is required to apportion. Note that if you compare the actual gas consumed to the modeled gas consumed for two fluorinated GHGs, you must certify that one of the fluorinated GHGs selected for comparison corresponds to the largest quantity consumed, on a mass basis, of fluorinated GHGs used at the fab that requires apportionment during the reporting year. [§98.96(m)(3)]	NotCertified
Reason for "not certified" selection (optional)
Result of calculation comparing actual and modeled gas consumption under §98.94(c)(2)(v) (the percent difference between actual and modeled gas consumption, relative to actual gas consumption). [§98.96(m)(4)]	11
If you are required to apportion f-GHG consumption between fabs, as required by 98.94(c)(2)(v), certification that the gas(es) you selected under §98.94(c)(2)(ii) correspond(s) to the largest quantities consumed on a mass basis, of f-GHG used at your facility during the reporting year for which you are required to apportion. [§98.96(m)(5)]	NotCertified
Reason for "not certified" selection (optional)

N2O Emissions Details

Method of reporting N2O emissions from chemical vapor deposition as calculated in Equation I-10 [§98.96(d)]	Used default utilization factor from Table I-8
Total annual N2O emissions from chemical vapor deposition as calculated in Equation I-10 [§98.96(c)(3)]	30.865
Method of reporting N2O emissions from electronic manufacturing processes as calculated in Equation I-11 [§98.96(d)]	Did not use N2O in other electronics manufacturing processes
Total annual N2O emissions from electronic manufacturing processes as calculated in Equation I-11 [§98.96(c)(3)]

Substrate Types Details

Substrate Type
"Other" Substrate Type
The Annual production in terms of substrate surface area for each fab (square meters) [§98.96(e)]

F-GHG Emissions Details

Unique Name/Identifier	HFC-23
Chemical Formula [98.96(c)(1)]	CHF3
Cas Number [98.96(c)(1)]	75-46-7
Gas Category [98.96(c)(1)]

Gas Name	HFC-23
Gas Description
Cas Number	75-46-7
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.655

Unique Name/Identifier	HFC-41
Chemical Formula [98.96(c)(1)]	CH3F
Cas Number [98.96(c)(1)]	593-53-3
Gas Category [98.96(c)(1)]

Gas Name	HFC-41
Gas Description
Cas Number	593-53-3
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.183

Unique Name/Identifier	Nitrogen trifluoride
Chemical Formula [98.96(c)(1)]	NF3
Cas Number [98.96(c)(1)]	7783-54-2
Gas Category [98.96(c)(1)]

Gas Name	Nitrogen trifluoride
Gas Description
Cas Number	7783-54-2
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.675

Gas Name	Nitrogen trifluoride
Gas Description
Cas Number	7783-54-2
Process Type	Chamber cleaning - in situ plasma
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.033

Gas Name	Nitrogen trifluoride
Gas Description
Cas Number	7783-54-2
Process Type	Chamber cleaning - remote plasma
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.137

Unique Name/Identifier	Perfluorobuta-1,3-diene
Chemical Formula [98.96(c)(1)]	CF2=CFCF=CF2
Cas Number [98.96(c)(1)]	685-63-2
Gas Category [98.96(c)(1)]

Gas Name	Perfluorobuta-1,3-diene
Gas Description
Cas Number	685-63-2
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.018

Unique Name/Identifier	Perfluorocyclobutane
Chemical Formula [98.96(c)(1)]	C-C4F8
Cas Number [98.96(c)(1)]	115-25-3
Gas Category [98.96(c)(1)]

Gas Name	Perfluorocyclobutane
Gas Description
Cas Number	115-25-3
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.103

Gas Name	Perfluorocyclobutane
Gas Description
Cas Number	115-25-3
Process Type	Chamber cleaning - in situ plasma
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.440

Unique Name/Identifier	PFC C-1418
Chemical Formula [98.96(c)(1)]	c-C5F8
Cas Number [98.96(c)(1)]	559-40-0
Gas Category [98.96(c)(1)]

Gas Name	PFC C-1418
Gas Description
Cas Number	559-40-0
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.009

Unique Name/Identifier	PFC-116 (Perfluoroethane)
Chemical Formula [98.96(c)(1)]	C2F6
Cas Number [98.96(c)(1)]	76-16-4
Gas Category [98.96(c)(1)]

Gas Name	PFC-116 (Perfluoroethane)
Gas Description
Cas Number	76-16-4
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.231

Unique Name/Identifier	PFC-14 (Perfluoromethane)
Chemical Formula [98.96(c)(1)]	CF4
Cas Number [98.96(c)(1)]	75-73-0
Gas Category [98.96(c)(1)]

Gas Name	PFC-14 (Perfluoromethane)
Gas Description
Cas Number	75-73-0
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	2.091

Gas Name	PFC-14 (Perfluoromethane)
Gas Description
Cas Number	75-73-0
Process Type	Chamber cleaning - in situ plasma
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.11

Gas Name	PFC-14 (Perfluoromethane)
Gas Description
Cas Number	75-73-0
Process Type	Chamber cleaning - remote plasma
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	1.326

Unique Name/Identifier	Sulfur hexafluoride
Chemical Formula [98.96(c)(1)]	SF6
Cas Number [98.96(c)(1)]	2551-62-4
Gas Category [98.96(c)(1)]

Gas Name	Sulfur hexafluoride
Gas Description
Cas Number	2551-62-4
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.297

F-HTF Emissions Details

F-HTF [§98.96(c)(4)]	HFE-7300 (1,1,1,2,2,3,4,5,5,5-decafluoro-3-methoxy-4-trifluoromethyl-pentane)
Chemical Formula [§98.96(c)(4)]	CF3CF2CF(OCH3)CF(CF3)2
Cas Number [§98.96(c)(4)]	132182-92-4
F-HTF Category [§98.96(c)(4)]	Saturated HFEs and HCFEs with 3 or more carbon-hydrogen bonds
Total Annual Emissions (metric tons) [§98.96(c)(4)]	0.15
Were missing data procedures used to estimate inputs into the fluorinated heat transfer fluid mass balance equation under $98.95(b)? [§98.96(s)]	No
How many times were missing data procedures followed in this reporting year? [§98.96(s)]	0
What method was used to estimate the missing data? [§98.96(s)]

F-HTF [§98.96(c)(4)]	HFE-7500 (3-ethoxy-1,1,1,2,3,4,4,5,5,6,6,6-dodecafluoro-2-trifluoromethyl-hexane)
Chemical Formula [§98.96(c)(4)]	CF3CF2CF2CF(OC2H5)CF(CF3)2
Cas Number [§98.96(c)(4)]	297730-93-9
F-HTF Category [§98.96(c)(4)]	Saturated HFEs and HCFEs with 3 or more carbon-hydrogen bonds
Total Annual Emissions (metric tons) [§98.96(c)(4)]	0.012
Were missing data procedures used to estimate inputs into the fluorinated heat transfer fluid mass balance equation under $98.95(b)? [§98.96(s)]	No
How many times were missing data procedures followed in this reporting year? [§98.96(s)]	0
What method was used to estimate the missing data? [§98.96(s)]

Abatement Systems Details

Abatement System Name/Identifier	GDC107
Certification that the site maintenance plan for abatement systems for which emissions are being reported contains manufacturer’s recommendations and specifications for installation, operation, and maintenance for each abatement system. [§98.96(q)]
Certification that the abatement systems for which emissions are being reported and for which default DRE are being used were specifically designed for fluorinated GHG and N2O abatement, as applicable. [§98.96(q)]
Certification in accordance with plan	Certified