Address: 4000 North Flash Drive
City: Lehi
State: UT
Postal Code: 84043

CO2 equivalent emissions from facility subparts C-II, SS, and TT (metric tons):240,927.1
CO2 equivalent emissions from supplier subparts LL-QQ (metric tons):
Biogenic CO2 emissions from facility subparts C-II, SS, and TT (metric tons):0
Cogeneration Unit Emissions Indicator:N
GHG Report Start Date:2020-01-01
GHG Report End Date:2020-12-31
Description of Changes to Calculation Methodology:
Did you use an EPA-approved BAMM in this reporting year for Subpart I?
Plant Code Indicator:N
Primary NAICS Code:334413
Second Primary NAICS Code:

Parent Company Details:

Subpart C: General Stationary Fuel Combustion

Subpart I: Electronics Manufacturing

Subpart I Fab Details (for MTU01):

Unique Name/Identifier	MTU01
Optional Description
What does the fab manufacture? [§98.96]	Semiconductor
Method used to calculate f-GHG emissions for this fab from the plasma etch/wafer clean and chamber clean process types [§98.96(d)]	DefaultEmissionFactors
Does the fab have abatement systems (as defined in 98.98) through which F-GHG or N2O flow?	Yes
Is the fab claiming destruction or removal efficiency for those abatement systems (as defined in 98.98) at the fab? [§98.96(p)]	No
What Is the Diameter of the Wafers Manufactured at this Fab? (Greater than 300 mm) [§98.96(b)]	No
What Is the Diameter of the Wafers Manufactured at this Fab? (300 mm) [§98.96(b)]	Yes
What Is the Diameter of the Wafers Manufactured at this Fab? (200 mm) [§98.96(b)]	No
What Is the Diameter of the Wafers Manufactured at this Fab? (150 mm) [§98.96(b)]	No
What Is the Diameter of the Wafers Manufactured at this Fab? (Less than 150 mm) [§98.96(b)]	No
List the Specific Wafer Size(s) Less than 150mm Manufactured at this Fab [§98.96(b)]
Annual Manufacturing Capacity at this Fab used in Equation I-5 (square meters) [§98.96(a)]
Annual production for this fab in terms of substrate surface area (e.g., silicon, PV-cell, glass) (square meters) [§98.96(e)]
Do the emissions for this fab include emissions from research and development activities, as defined in 98.6?	No
What is the approximate percentage of total GHG emissions, on a metric ton CO2e basis, that are attributable to research and development activities? [§98.96(x)]
What is the effective fab-wide destruction or removal efficiency value calculated using Equations I-26, I-27 and I-28, as appropriate? (decimal fraction) [§98.96(r)]	0
What method was used for this fab to develop the apportioning factors for fluorinated GHG and N20 consumption? [§98.96(m)(1)]
Optional description of your system and method(s) used in the fab-specific apportioning model
Description of quantifiable metric used in engineering model to apportion gas consumption [§98.96(m)(1)]
Start date selected under 98.94(c)(2)(i). [§98.96(m)(2)]	2020-10-20
End date selected under 98.94(c)(2)(i). [§98.96(m)(2)]	2020-12-10
Certification that the gas(es) selected under 98.94(c)(2)(ii) for this fab corresponds to the largest quantity(ies) consumed, on a mass basis, of fluorinated GHG used at the fab in the reporting year which the facility is required to apportion. Note that if you compare the actual gas consumed to the modeled gas consumed for two fluorinated GHGs, you must certify that one of the fluorinated GHGs selected for comparison corresponds to the largest quantity consumed, on a mass basis, of fluorinated GHGs used at the fab that requires apportionment during the reporting year. [§98.96(m)(3)]	Certified
Reason for "not certified" selection (optional)
Result of calculation comparing actual and modeled gas consumption under §98.94(c)(2)(v) (the percent difference between actual and modeled gas consumption, relative to actual gas consumption). [§98.96(m)(4)]	14
If you are required to apportion f-GHG consumption between fabs, as required by 98.94(c)(2)(v), certification that the gas(es) you selected under §98.94(c)(2)(ii) correspond(s) to the largest quantities consumed on a mass basis, of f-GHG used at your facility during the reporting year for which you are required to apportion. [§98.96(m)(5)]
Reason for "not certified" selection (optional)

N2O Emissions Details

Method of reporting N2O emissions from chemical vapor deposition as calculated in Equation I-10 [§98.96(d)]	Used default utilization factor from Table I-8
Total annual N2O emissions from chemical vapor deposition as calculated in Equation I-10 [§98.96(c)(3)]	22.88941121
Method of reporting N2O emissions from electronic manufacturing processes as calculated in Equation I-11 [§98.96(d)]	Did not use N2O in other electronics manufacturing processes
Total annual N2O emissions from electronic manufacturing processes as calculated in Equation I-11 [§98.96(c)(3)]

Substrate Types Details

Substrate Type
"Other" Substrate Type
The Annual production in terms of substrate surface area for each fab (square meters) [§98.96(e)]

F-GHG Emissions Details

Unique Name/Identifier	HFC-23
Chemical Formula [98.96(c)(1)]	CHF3
Cas Number [98.96(c)(1)]	75-46-7
Gas Category [98.96(c)(1)]

Gas Name	HFC-23
Gas Description
Cas Number	75-46-7
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.56325587

Unique Name/Identifier	HFC-32
Chemical Formula [98.96(c)(1)]	CH2F2
Cas Number [98.96(c)(1)]	75-10-5
Gas Category [98.96(c)(1)]

Gas Name	HFC-32
Gas Description
Cas Number	75-10-5
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.15793548

Unique Name/Identifier	HFC-41
Chemical Formula [98.96(c)(1)]	CH3F
Cas Number [98.96(c)(1)]	593-53-3
Gas Category [98.96(c)(1)]

Gas Name	HFC-41
Gas Description
Cas Number	593-53-3
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.13825989

Unique Name/Identifier	Nitrogen trifluoride
Chemical Formula [98.96(c)(1)]	NF3
Cas Number [98.96(c)(1)]	7783-54-2
Gas Category [98.96(c)(1)]

Gas Name	Nitrogen trifluoride
Gas Description
Cas Number	7783-54-2
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.79796942

Gas Name	Nitrogen trifluoride
Gas Description
Cas Number	7783-54-2
Process Type	Chamber cleaning - remote plasma
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.81392881

Unique Name/Identifier	Perfluorobuta-1,3-diene
Chemical Formula [98.96(c)(1)]	CF2=CFCF=CF2
Cas Number [98.96(c)(1)]	685-63-2
Gas Category [98.96(c)(1)]

Gas Name	Perfluorobuta-1,3-diene
Gas Description
Cas Number	685-63-2
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.08301214

Unique Name/Identifier	Perfluorocyclobutane
Chemical Formula [98.96(c)(1)]	C-C4F8
Cas Number [98.96(c)(1)]	115-25-3
Gas Category [98.96(c)(1)]

Gas Name	Perfluorocyclobutane
Gas Description
Cas Number	115-25-3
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.18670917

Unique Name/Identifier	PFC-116 (Perfluoroethane)
Chemical Formula [98.96(c)(1)]	C2F6
Cas Number [98.96(c)(1)]	76-16-4
Gas Category [98.96(c)(1)]

Gas Name	PFC-116 (Perfluoroethane)
Gas Description
Cas Number	76-16-4
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	1.24264973

Unique Name/Identifier	PFC-14 (Perfluoromethane)
Chemical Formula [98.96(c)(1)]	CF4
Cas Number [98.96(c)(1)]	75-73-0
Gas Category [98.96(c)(1)]

Gas Name	PFC-14 (Perfluoromethane)
Gas Description
Cas Number	75-73-0
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	7.36601292

Gas Name	PFC-14 (Perfluoromethane)
Gas Description
Cas Number	75-73-0
Process Type	Chamber cleaning - remote plasma
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	3.59086239

Unique Name/Identifier	Sulfur hexafluoride
Chemical Formula [98.96(c)(1)]	SF6
Cas Number [98.96(c)(1)]	2551-62-4
Gas Category [98.96(c)(1)]

Gas Name	Sulfur hexafluoride
Gas Description
Cas Number	2551-62-4
Process Type	Plasma etching / Wafer cleaning
Calculation Method	Used default factors
Annual emissions for this F-GHG - Process Type - Calculation Method (metric tons) [98.96(c)(1)]	0.16763999

F-HTF Emissions Details

F-HTF [§98.96(c)(4)]	FC-3283/FC-8270 (Perfluorotripropylamine)
Chemical Formula [§98.96(c)(4)]	(C3F7)3N
Cas Number [§98.96(c)(4)]	338-83-0
F-HTF Category [§98.96(c)(4)]	Fully fluorinated GHGs
Total Annual Emissions (metric tons) [§98.96(c)(4)]	3.12422266
Were missing data procedures used to estimate inputs into the fluorinated heat transfer fluid mass balance equation under $98.95(b)? [§98.96(s)]	No
How many times were missing data procedures followed in this reporting year? [§98.96(s)]	0
What method was used to estimate the missing data? [§98.96(s)]

F-HTF [§98.96(c)(4)]	FC-40/FC-43 (Perfluorotributylamine (PTBA))
Chemical Formula [§98.96(c)(4)]	(C4F9)3N
Cas Number [§98.96(c)(4)]	1064698-37-8
F-HTF Category [§98.96(c)(4)]	Fully fluorinated GHGs
Total Annual Emissions (metric tons) [§98.96(c)(4)]	0.17100000
Were missing data procedures used to estimate inputs into the fluorinated heat transfer fluid mass balance equation under $98.95(b)? [§98.96(s)]	No
How many times were missing data procedures followed in this reporting year? [§98.96(s)]	0
What method was used to estimate the missing data? [§98.96(s)]

F-HTF [§98.96(c)(4)]	HFE-569sf2, (HFE-7200) Isomer blend
Chemical Formula [§98.96(c)(4)]	C4F9OC2H5, (CF3)2CFCF2OC2H5
Cas Number [§98.96(c)(4)]	163702-05-4, 163702-06-5
F-HTF Category [§98.96(c)(4)]
Total Annual Emissions (metric tons) [§98.96(c)(4)]	0.14250000
Were missing data procedures used to estimate inputs into the fluorinated heat transfer fluid mass balance equation under $98.95(b)? [§98.96(s)]	No
How many times were missing data procedures followed in this reporting year? [§98.96(s)]	0
What method was used to estimate the missing data? [§98.96(s)]

F-HTF [§98.96(c)(4)]	HFE-7500 (3-ethoxy-1,1,1,2,3,4,4,5,5,6,6,6-dodecafluoro-2-trifluoromethyl-hexane)
Chemical Formula [§98.96(c)(4)]	CF3CF2CF2CF(OC2H5)CF(CF3)2
Cas Number [§98.96(c)(4)]	297730-93-9
F-HTF Category [§98.96(c)(4)]	Saturated HFEs and HCFEs with 3 or more carbon-hydrogen bonds
Total Annual Emissions (metric tons) [§98.96(c)(4)]	0.02608000
Were missing data procedures used to estimate inputs into the fluorinated heat transfer fluid mass balance equation under $98.95(b)? [§98.96(s)]	No
How many times were missing data procedures followed in this reporting year? [§98.96(s)]	0
What method was used to estimate the missing data? [§98.96(s)]

F-HTF [§98.96(c)(4)]	HT-200
Chemical Formula [§98.96(c)(4)]	CF3(OCFCF3CF2)n-(OCF2)m-OCF3
Cas Number [§98.96(c)(4)]	69991-67-9 (h)
F-HTF Category [§98.96(c)(4)]	Fully fluorinated GHGs
Total Annual Emissions (metric tons) [§98.96(c)(4)]	1.72162000
Were missing data procedures used to estimate inputs into the fluorinated heat transfer fluid mass balance equation under $98.95(b)? [§98.96(s)]	No
How many times were missing data procedures followed in this reporting year? [§98.96(s)]	0
What method was used to estimate the missing data? [§98.96(s)]